Impact of the Reconstruction Condition on Gallium Arsenide Surface Morphology during Molecular-Beam Epitaxy and Vacuum Annealing

Andrey V. Vasev
1. Институт физики полупроводников им. А. В. Ржанова СО РАН Новосибирск, Россия
vasev@isp.nsc.ru
Mikhail А. Putyato
1. Институт физики полупроводников им. А. В. Ржанова СО РАН Новосибирск, Россия
Boris R. Semyagin
1. Институт физики полупроводников им. А. В. Ржанова СО РАН Новосибирск, Россия
Материал поступил в редколлегию 10.07.2008
The peculiarities of morphological evolution during GaAs(001) molecular beam epitaxy are studied by RHEED and AFM methods. A clear correlation is established between surface superstructure and morphological evolution. Thermodynamic conditions are experimentally determined which provide the most perfect GaAs(001) epilayer surface. For the (2 × 4) surface reconstruction growth conditions are established which give rise to surface roughening. A new technique is proposed and tested to significantly increase the efficacy of surface smoothening procedure under As flux.

Keywords:
GaAs, surface morphology, reconstruction, vacuum annealing, molecular-beam epitaxy
УДК 538.911; 538.913; 537.874.6

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Выходные данные: Vasev A.V., Putyato M.A., Semyagin B.R., Seleznev V.A., Preobrazhensky V.V. Impact of the Reconstruction Condition on Gallium Arsenide Surface Morphology during Molecular-Beam Epitaxy and Vacuum Annealing . Vestnik NSU. Series: Physics 2008, vol. 3, no. 4. С. 9–19 (in Russ.).
DOI 10.54362/1818-7919-2008-3-4-9-19